Photolithography Mask Aligner Filters

Omega Optical offers mask aligner optical filters which provide improved exposures and sharper, straighter feature walls of the SU-8 photoresist. This filter provides a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines. It is 90% transparent to visible light (or provides 90% transmission), allowing for proper visualization of mask alignment through the filter glass.

MicroChem Corp recommends Omega Optical's PL-360LP optical filter for use with its SU-8 photoresist.

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View mask aligner filters