SBA-Registered Small Business • ISO 9001:2008 Certified • ITAR Registered • Made in the USA   |   1-866-488-1064   |   +1-802-251-7300

PL-360LP Photolithography Mask Aligner Filter 165x165mm

PL-360LP Photolithography Mask Aligner Filter 165x165mm
$235.00

Availability: 2 In stock

The PL-360LP mask aligner filter for photolithography offers improved exposures, and sharper, straighter feature walls of the SU-8 photoresist. With a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines.
Customize this Filter: Request a quote for custom specifications, sizes, or volume quantities.
OR

Description

Details

The PL-360LP mask aligner filter for photolithography offers improved exposures, and sharper, straighter feature walls of the SU-8 photoresist. With a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines.

Spectral Curves

The spectral curve and ascii data is a typical representation of this filter's performance, but may vary due to production and design variations. Omega only guarantees this part to meet the product specifications listed.

Detailed Specifications

Additional Information

SKU W2927
Filter Type Longpass
Inventory Type Stock
Coating Type Protected Coating
Shape Rectangle
Length (mm) 165.1
Length Tolerance (mm) +1/-1
Width (mm) 165.1
Width Tolerance (mm) +1/-1
Thickness (mm) 2
Thickness Tolerance (mm) +0.25/-0.25
Clear Aperture Diameter (mm) ns
Flatness ns
Parallelism ns
Mounting Type Unmounted
Cut-On Wavelength (nm) 365
Cut-On Wavelength Tolerance (nm) +7/-7
Transmitted Wavefront Distortion ns
Angle of Incidence 0
Minimum Surface Quality Surface per MIL-O-13830A (80/50)