DetailsThe PL-360LP mask aligner filter for photolithography offers improved exposures, and sharper, straighter feature walls of the SU-8 photoresist. With a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines.
Spectral CurvesThe spectral curve and ascii data is a typical representation of this filter's performance, but may vary due to production and design variations. Omega only guarantees this part to meet the product specifications listed.
SKU W2930 Filter Type Longpass Inventory Type Stock Coating Type Protected Coating Shape Rectangle Length (mm) 215.9 Length Tolerance (mm) +1/-1 Width (mm) 215.9 Width Tolerance (mm) +1/-1 Thickness (mm) 2 Thickness Tolerance (mm) +0.25/-0.25 Clear Aperture Diameter (mm) ns Flatness ns Parallelism ns Mounting Type Unmounted Cut-On Wavelength (nm) 365 Cut-On Wavelength Tolerance (nm) +7/-7 Transmitted Wavefront Distortion ns Angle of Incidence 0 Minimum Surface Quality Surface per MIL-O-13830A (80/50)