PL-360LP Photolithography Mask Aligner Filter 165x165mm

SKU: W2927

The PL-360LP mask aligner filter for photolithography offers improved exposures, and sharper, straighter feature walls of the SU-8 photoresist. With a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines.
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The PL-360LP mask aligner filter for photolithography offers improved exposures, and sharper, straighter feature walls of the SU-8 photoresist. With a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines.

Spectral Curves

The spectral curve and ascii data is a typical representation of this filter’s performance, but will vary due to production and design variations. Omega only guarantees this part to meet the product specifications listed. The displayed OD is calculated from a %T measurement. The blocking regions are likely higher OD than what is displayed here. To learn more about the challenges of measuring high OD values, see our paper.

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Detailed Specifications

Physical Thickness
2.00
Thickness Tolerance (mm)
+0.25/-0.25
Clear Aperture Diameter (mm)
ns
Transmitted Wavefront Distortion
ns
Angle of Incidence
0
Minimum Surface Quality
Surface per MIL-O-13830A (80/50)
Mounting Type
Unmounted
Coating Type
Protected Coating
Shape
Rectangle
Filter Type
Longpass
Filter Application
Photolithography
Fluorescence Component
Photolithography
Flatness
ns
Length (mm)
165.10
Width (mm)
165.10
Length Tolerance
+1/-1
Width Tolerance
+1/-1
Parallelism
ns
Cut-on Wavelength (nm)
365.00
Cut-on Wavelength Tolerance
+7/-7